Equipment list

A

Atomic Force Microscopy
  • mapping of physical topography
  • localized measure of electrostatic and magnetic forces
  • analysis of work function differences
  • electrical characterization of nano-scale features
Auger Electron Spectroscopy
  • surface sensitive elemental distribution maps
  • capable of depth profiling using ion sputtering
  • physical imaging of a surface

B

Bulk Crystal Growth
  • single crystal growth
  • materials include ferroelectrics

C

Chemical Vapour Deposition
  • thermal process furnaces
    • poly-silicon deposition
    • silicon oxide growth
    • silicon nitride deposition
  • diffusion furnace
    • n-type semiconductor doping
  • plasma enhanced deposition
    • silicon oxides and silicon nitrides growth
    • low temperature deposition
Contact Angle Goniometer
  • measure of interfacial energies
  • dynamic contact angle analysis
  • capable of automated measurements