New Atomic Layer Deposition Tool

September 01, 2011

A new atomic layer deposition system was received on September 1, 2011 from Cambridge Nanotech (CNT) of Cambridge, MA.  This tool allows precise control and deposition of thin, specialty or “designer” films; it is capable of high aspect ratio depositions, particularly useful in applications such as microfluidic channels.  Advanced materials research is to be performed in collaboration with SFU Department of Chemistry and CNT via development of new chemical precursors with their subsequent application via the CNT Fiji 200 ALD system.  This tool was made possible by funds from NSERC, BCKDF, and CFI grants and is anticipated to be available to users at the end of September for their research and development work.

No comments yet