4D LABS Seminar - Helium Ion Microscopy

April 12, 2016
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4D LABS is hosting a series of seminars in 2016 highlighting the capabilities of our facilities to the community. In our second seminar, Dr. Doug Wei, from Carl Zeiss Microscopy, will discuss our new helium ion microscope (HIM). In this presentation, a brief overview of the fundamentals of HIM technology, the instrumentation of a HIM and the major applications of the NanoFab platform will be introduced and discussed.

We hope to see you there!

Date: April 19, 2016

Time: 2:00 pm

Location: Room TASC2 8500 at SFU Burnaby

Summary of talk:

Helium ion microscopy was developed based on gas field ion source (GFIS) technology, and has initially been used primarily for imaging when it was introduced to the market in 2006. Recent development in applications has been shifted to nano fabrication mainly due to its superior probe quality. With a probe size of ≤0.5 nanometer, the He ion beam enables nanoscale patterning such as nanopore fabrication with pore size as small as 2 nanometers and line patterning of sub 10 nanometers line width. Compared with focused Ga ion beam, Ne and He gases are inert leaving no chemical contamination in the processed sample. Using this advantage, we are developing TEM sample preparation module on a two-column-three-beam system (the Orion NanoFab) as well as automated serial cutting and imaging module for 3D nano tomography. In this presentation, a brief overview of the fundamentals of GFIS technology, the instrumentation of an HIM and the major applications of the NanoFab platform will be introduced and discussed.