Developer station

This tool is used to run spin development programs on photoresist.  It is equipped with the following dispense options:

  • AZ 300 MIF developer
  • PPD 455 developer
  • AZ 400K 1:4 developer
  • Front-side rinse
  • Back-side rinse

There are vacuum chucks for chips, 50 mm wafers, 100 mm wafers, 4" masks, and 5" masks.

Tool Specs

Manufacturer CEE
Model 200XD
Typical Application Automatic development of photoresist
Location 6060.7
Related Documents

Standard Operating Procedure

Training Contact Mohamad Rezaei - rezaei@4dlabs.ca