Deep Reactive Ion Etcher
The Rapier™ DRIE system at 4D LABS is equipped with an LPX transport module. The system is configured with SF6 and C4F8 gases and operates based on the Bosch process for silicon deep etching. It is capable of etching silicon with high aspect ratios (>40) and fast etch rates (>20 µm/min). Endpoint detection is possible using the Claritas system. While not its primary function, the system is also capable of etching silicon oxide.
|Typical Application||Deep etching of silicon
|Training Contact||Hadi Esmaeilsabzali - email@example.com|