Mask aligner 1

  • Sub-micron features with vacuum contact
  • Interchangeable deep UV (254 nm) and near UV (365 nm) optics
  • 4-camera front and back-side alignmentprocessing for small pieces, 50 and 100 mm wafers
  • Configured for 75, 100, and 125 mm masks

Tool Specs

Manufacturer OAI
Model MBA 800
Typical Application Optical lithography
Location 6060.11
Related Documents

Standard Operating Procedure

Training Contact Grace Li - li@4dlabs.ca