Rapid thermal annealer 1

  • Temperature range: Up to 1000 ºC
  • Temperature ramp rate: 0.1 ºC/s to 200 ºC/s
  • O2 and N2 gases
  • 100 mm wafer chamber capability

Tool Specs

Manufacturer AnnealSys
Model AS-One 100
Typical Application Thermal processing
Location 6060.6
Related Documents Standard Operating Procedure
Training Contact Mohamad Rezaei - rezaei@4dlabs.ca