Spin-rinse-dryer

Spin-rinse and drying capability in one chamber.

  • Double-stack chamber
  • Each SRD chamber is operated by its own programmable controller that accepts user recipe input
  • Includes resistivity monitor
  • Processing for 50 and 100 mm wafer cassettes

Tool Specs

Tool Status Up
Manufacturer Semitool
Model 840S
Typical Application Rinsing and drying of cassette wafers
Location 6060.5
Training Contact Grace Li - li@4dlabs.ca