Spin-rinse-dryer

Spin-rinse and drying capability in one chamber.

  • Double-stack chamber
  • Each SRD chamber is operated by its own programmable controller that accepts user recipe input
  • Includes resistivity monitor
  • Processing for 50 and 100 mm wafer cassettes

Tool Specs

Manufacturer Semitool
Model 840S
Typical Application Rinsing and drying of cassette wafers
Location 6060.5
Training Contact Grace Li - li@4dlabs.ca