Tube furnace 4 - Poly-Si

  • Doped and undoped polysilicon LPCVD
  • Processing for 50 and 100 mm wafers

Tool Specs

Tool Status Up
Manufacturer Tystar
Typical Application Nitride and polysilicon deposition
Location 6060.4
Related Documents Standard Operating Procedure
Training Contact Hadi Esmaeilsabzali - hesmaeil@sfu.ca