Tube furnace 3 - Si3N4

  • Ultra-low stress and stoichiometric silicon nitride LPCVD 
  • Processing for 50 and 100 mm wafers

Tool Specs

Tool Status Up
Manufacturer Tystar
Typical Application Nitride deposition
Location 6060.4
Related Documents Standard Operating Procedure
Training Contact Hadi Esmaeilsabzali - hesmaeil@sfu.ca