Wetbench 3: developers

  • Development of resists
  • Large tank for cleaning furnace tubes with HF drain and large cover
  • 4 electrical outlets
  • 2 Teflon DI guns and 2 N2 gun

Tool Specs

Typical Application Photoresist development
Location 6060.7
Related Documents Standard Operating Procedure
Training Contact Grace Li - li@4dlabs.ca